Effects of Ion Channeling and Co-implants on Ion Ranges and Damage in Si: Studies with PL, SRP, SIMS and MC models
Author: Samu Viktor, Kerekes Árpád, Pongrácz Anita, Durkó Zsolt
Topic: microPL; JPV; photo-modulated reflectance
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The SRP-2100 series is Semilab’s flagship solution for high-precision spreading resistance profiling (SRP) and dopant concentration analysis in semiconductor wafers. Suitable for silicon and compound semiconductors (with PCIV option), it delivers fully automated, accurate depth profiling for process monitoring, failure analysis, and device characterization.
SRP-2100 / SRP-2100i Spreading Resistance Profiling
Author: Samu Viktor, Kerekes Árpád, Pongrácz Anita, Durkó Zsolt
Topic: microPL; JPV; photo-modulated reflectance
Author: E. E. Najbauer, L. Sinkó, Sz. Biró, Z. Durkó, P. Basa
Topic: carrier density; epitaxial layer; semiconductor; Silicon (Si); SRP-2100; SRP; FTIR REFLECTOMETRY
SRP-2100 / SRP-2100i Spreading Resistance Profiling